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Dry etching of AlxGa1–xN/GaN by CCl2F2 chemistry for device isolation
W.S. Lau, B.P. Singh, Joy B.H. Tan, S. Gunawan, Y.Y. Jiang, Richard Thet Wynn, Vanissa S. W. Lim, A.D. TriggVolume:
2
Year:
2005
Language:
english
Pages:
4
DOI:
10.1002/pssc.200461324
File:
PDF, 82 KB
english, 2005