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[IEEE 2015 IEEE International Electron Devices Meeting (IEDM) - Washington, DC, USA (2015.12.7-2015.12.9)] 2015 IEEE International Electron Devices Meeting (IEDM) - Diamond-shaped Ge and Ge0.9Si0.1 gate-all-around nanowire FETs with four {111} facets by dry etch technology
Lee, Yao-Jen, Hou, Fu-Ju, Chuang, Shang-Shiun, Hsueh, Fu-Kuo, Kao, Kuo-Hsing, Sung, Po-Jung, Yuan, Wei-You, Yao, Jay-Yi, Lu, Yu-Chi, Lin, Kun-Lin, Wu, Chien-Ting, Chen, Hisu-Chih, Chen, Bo-Yuan, HuangYear:
2015
Language:
english
DOI:
10.1109/iedm.2015.7409701
File:
PDF, 1.55 MB
english, 2015