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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Integrated Circuit Metrology, Inspection, and Process Control VII - Interferometric measurement of etch depths in phase-shift masks
Troccolo, Patrick M., Cohen, Donald K., Tam, Nelson, Dao, Giang T., Qian, Qi-De, Postek, Michael T.Volume:
1926
Year:
1993
Language:
english
DOI:
10.1117/12.149001
File:
PDF, 698 KB
english, 1993