SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Laser-written binary OMOG photomasks for high-volume non-critical 193-nm photolithographic layers
Ackmann, Paul W., Hayashi, Naoya, Rivière, Rémi, Gopalakrishnan, Selvi, Mazur, Martin, Öner, Nevzat, Mühle, Sven, Seltmann, RolfVolume:
9235
Year:
2014
Language:
english
DOI:
10.1117/12.2059622
File:
PDF, 1.10 MB
english, 2014