SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Mask model calibration for MPC applications utilizing shot dose assignment
Ackmann, Paul W., Hayashi, Naoya, Bork, Ingo, Buck, Peter, Paninjath, Sankaranarayanan, Mishra, Kushlendra, Bürgel, Christian, Standiford, Keith, Chua, Gek SoonVolume:
9235
Year:
2014
Language:
english
DOI:
10.1117/12.2069617
File:
PDF, 2.01 MB
english, 2014