![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Non-isotropic shadow effect with various pattern direction in anamorphic high numerical aperture system
Panning, Eric M., Goldberg, Kenneth A., Kim, In-Seon, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Oh, Hye-KeunVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2219874
File:
PDF, 897 KB
english, 2016