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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - PED-stabilized chemically amplified photoresist
Tanabe, Takayoshi, Kobayashi, Yasutaka, Tsuji, Akira, Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241851
File:
PDF, 565 KB
english, 1996