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SPIE Proceedings [SPIE Photonics China '98 - Beijing, China (Wednesday 16 September 1998)] Current Developments in Optical Elements and Manufacturing - Analysis of errors and calibration method for manufacturing multilevel diffractive optical element by ion etching
Fu, Yongqi, Lu, Zhenwu, Ma, Yueying, Weng, Zhicheng, Xin, Qiming, Parks, Robert E.Volume:
3557
Year:
1998
Language:
english
DOI:
10.1117/12.318298
File:
PDF, 265 KB
english, 1998