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SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node
Petersen, John S., McCallum, Martin, Kachwala, Nishrin, Socha, Robert J., Chen, J. Fung, Laidig, Thomas L., Smith, Bruce W., Gordon, Ronald L., Mack, Chris A., Grenon, Brian J., Abboud, Frank E.Volume:
3546
Year:
1998
Language:
english
DOI:
10.1117/12.332837
File:
PDF, 3.89 MB
english, 1998