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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Effect of photoacid generators on the formation of residues in an organic BARC process
Shimomura, Koji, Okuda, Yoshimitsu, Okazaki, Hiroshi, Kinoshita, Yoshiaki, Pawlowski, Georg, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350221
File:
PDF, 792 KB
english, 1999