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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Cycloolefin-maleic anhydride copolymers for 193-nm resist compositions
Rahman, M. D., Bae, Jun-Bom, Cook, Michelle M., Durham, Dana L., Kudo, Takanori, Kim, Woo-Kyu, Padmanaban, Munirathna, Dammel, Ralph R., Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388306
File:
PDF, 1.86 MB
english, 2000