SPIE Proceedings [SPIE International Symposium on Microelectronics and Assembly - Singapore, Singapore (Monday 27 November 2000)] Advanced Microelectronic Processing Techniques - Plasma removal of post-RIE residues for dual-damascence processing
Bliznetsov, Vladimir N., Jo, Woo-Min, Harrison, H. Barry, Wee, Andrew T. S., Gupta, SubhashVolume:
4227
Year:
2000
Language:
english
DOI:
10.1117/12.405391
File:
PDF, 419 KB
english, 2000