SPIE Proceedings [SPIE 26th Annual International Symposium...

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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Aberration analysis using reconstructed aerial images of isolated contacts on attenuated phase-shift masks

Zach, Franz X., Lin, Chieh-yu, Kirk, Joseph P., Progler, Christopher J.
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Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435674
File:
PDF, 364 KB
english, 2001
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