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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Simulation of image quality issues at low k1 for 100-nm lithography
Neureuther, Andrew R., Adam, Konstantinos, Hotta, Shoji, Pistor, Thomas V., Robins, Garth, Deng, Yunfei, Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438395
File:
PDF, 322 KB
english, 2001