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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Critical Dimension and Image Placement Issues for Step and Flash Imprint Lithography Templates
Nordquist, Kevin J., Mancini, David P., Dauksher, William J., Ainley, Eric S., Gehoski, Kathleen A., Resnick, Douglas J., Masnyj, Zorian S., Mangat, Pawitter J. S., Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.467753
File:
PDF, 414 KB
english, 2002