SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Characterization and reduction of highly localized substrate contamination defects in metal patterning
Gu, Yiming, Zhang, Anqing, Yu, Zhenjiang, Cao, Wanqing, Chen, Sean, Sturtevant, John L., Lee, Shih-Ked, Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473504
File:
PDF, 1.13 MB
english, 2002