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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Implementing fully automatic macro defect detection and classification system in high-production semiconductor fab
Lee, Lloyd, Pham, Michael, Pham, David, Khaja, Manyam, Hennessey, Kathleen A., Miller, Juanita, Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473524
File:
PDF, 340 KB
english, 2002