SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - CD versus pitch across the slit for multiple 248-nm step-and-scan exposure tools
Finders, Jo, de Kruif, Robert, Bruls, Richard, Bouchoms, Igor, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474571
File:
PDF, 962 KB
english, 2002