SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography
Kim, Si-Hyun, Lee, Si-Hyeung, Yeo, Gi-Sung, Lee, Jeong Hyeong, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485117
File:
PDF, 472 KB
english, 2003