SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Outlier rejection with mixture models in alignment
Nakajima, Shinichi, Kanaya, Yuho, Li, Mengling, Sugihara, Taro, Sukegawa, Ayako, Magome, Nobutaka, Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485385
File:
PDF, 214 KB
english, 2003