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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Actinic aerial image measurement tool for 157-nm mask qualification
Yasui, Takashi, Tanabe, Hiroyoshi, Higashikawa, Iwao, Kuschnerus, Peter, Engel, Thomas, Zibold, Axel M., Hertfelder, Claudia, Kobiyama, Yuji, Urbach, Jan-Peter, Schilz, Christof M., Semmler, ArminVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504215
File:
PDF, 1.13 MB
english, 2003