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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Prospects for using primary electron-based CD metrology
Rice, Bryan J., Silver, Richard M., Crays, Gary L., Danilevsky, Alex, Grumski, Michael G., Koshihara, Shunsuke, Otaka, Tadashi, Roberts, Jeanette M.Volume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.544232
File:
PDF, 111 KB
english, 2004