![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Investigations on microloading effect: a parallel approach to PGSD (proximity gap suction development)
Courboin, Daniel, Tanabe, Hiroyoshi, Choi, Jong Woo, Jung, S. H., Baek, Seung Hee, Kim, Lee-Ju, Ahn, Chang Nam, Kim, Hong-SeokVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557708
File:
PDF, 338 KB
english, 2004