SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Single-exposure general vortex phase-shift mask for contact hole
Liu, Yong, Liu, Dun, Hu, James, Staud, Wolfgang, Weed, J. TracyVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.567874
File:
PDF, 313 KB
english, 2004