SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - New advanced BARC materials for ultra-high NA applications
Claypool, James B., Sturtevant, John L., Weimer, Marc, Krishnamurthy, Vandana, Gehoel, Wendy, van Ingen Schenau, KoenVolume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.599988
File:
PDF, 1.85 MB
english, 2005