![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Evaluation of functional properties of imaging materials for water immersion lithography
Hinsberg, William D., Sturtevant, John L., Hoffnagle, J. A., Wallraff, G. M., Larson, C. E., Houle, F. A., Sundberg, Linda, Truong, Hoa D., Davis, Blake W., Allen, Robert D.Volume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.600560
File:
PDF, 702 KB
english, 2005