SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Back end of line metrology control applications using scatterometry
Towidjaja, Linda, Archie, Chas N., Raymond, Christopher, Littau, Mike, Forman, Darren, Hummel, Steven G.Volume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.656515
File:
PDF, 684 KB
english, 2006