SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - New contamination experimental equipment in the NewSUBARU and evaluation of Si-capped multilayer mirrors using it
Niibe, Masahito, Lercel, Michael J., Kakutani, Yukinobu, Terashima, Shigeru, Takase, Hiromitsu, Gomei, Yoshio, Matsunari, Shuichi, Aoki, Takashi, Murakami, Katsuhiko, Fukuda, YasuakiVolume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.656845
File:
PDF, 325 KB
english, 2006