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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Megasonic cleaning, cavitation, and substrate damage: an atomistic approach
Kapila, Vivek, Hoga, Morihisa, Deymier, Pierre A., Shende, Hrishikesh, Pandit, Viraj, Raghavan, Srini, Eschbach, Florence O.Volume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681771
File:
PDF, 815 KB
english, 2006