SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Data processing system in electron beam direct writing to obtain photolithography friendly resist patterns
Hoshino, Hiromi, Lercel, Michael J., Machida, YasuhideVolume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.711425
File:
PDF, 653 KB
english, 2007