SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Real-time profile shape reconstruction using dynamic scatterometry
Soulan, Sébastien, Archie, Chas N., Besacier, Maxime, Leveder, Tanguy, Schiavone, PatrickVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.712015
File:
PDF, 1.30 MB
english, 2007