SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA...

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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - The gate CD uniformity improvement by the layout retarget with refer to the litho process

Chung, No-Young, Flagello, Donis G., Yoon, Yeon-Ju, Lee, Sung-Ho, Kim, Sung-Il, Ha, Sang-Rok, Lee, Sun-Yong
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Volume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.712073
File:
PDF, 358 KB
english, 2007
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