SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Improvement of CD variation control for attenuated phase-shift mask
Takagi, Mikio, Mizoguchi, Takashi, Kojima, Yosuke, Saga, Tadashi, Haraguchi, Takashi, Fukushima, Yuichi, Tanaka, Tsuyoshi, Okuda, Yoshimitsu, Inazuki, Yukio, Yoshikawa, Hiroki, Okazaki, Satoshi, WatanVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728924
File:
PDF, 794 KB
english, 2007