SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Dependence of acid generation efficiency on acid molecular structure and concentration of acid generator in chemically amplified EUV resist
Henderson, Clifford L., Hirose, Ryo, Kozawa, Takahiro, Tagawa, Seiichi, Kai, Toshiyuki, Shimokawa, TsutomuVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.772569
File:
PDF, 270 KB
english, 2008