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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Experimental evaluation of particulate contamination on backside of EUV reticle
Ota, Kazuya, Schellenberg, Frank M., La Fontaine, Bruno M., Taguchi, Takao, Amemiya, Mitsuaki, Nishimura, Naosuke, Suga, OsamuVolume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.812952
File:
PDF, 622 KB
english, 2009