SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Evaluation of alcoholic hydroxyl derivatives for chemically amplified extreme ultraviolet resist
Furukawa, Kikuo, Henderson, Clifford L., Kozawa, Takahiro, Tagawa, SeiichiVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814005
File:
PDF, 233 KB
english, 2009