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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control
Finders, Jo, Levinson, Harry J., Dusa, Mircea V., Dusa, Mircea, Vleeming, Bert, Fliervoet, Timon, Hepp, Birgitt, Megens, Henry, Groenendijk, Remco, Quaedackers, John, Mos, Evert, Leewis, Christian, BoVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814091
File:
PDF, 1.58 MB
english, 2009