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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - High refractive index nanoparticle fluids for 193-nm immersion lithography
Trikeriotis, Markos, Henderson, Clifford L., Rodriguez, Robert, Zettel, Michael F., Bakandritsos, Aristeidis, Bae, Woo Jin, Zimmerman, Paul A., Ober, Christopher K., Giannelis, Emmanuel P.Volume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814408
File:
PDF, 282 KB
english, 2009