SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Highly sensitive EUV-resist based on thiol-ene radical reaction
Shirai, Masamitsu, Allen, Robert D., Maki, Koichi, Okamura, Haruyuki, Kaneyama, Koji, Itani, ToshiroVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846339
File:
PDF, 1.19 MB
english, 2010