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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Dynamics of radical cation of poly(4-hydroxystyrene) generated in thin film upon exposure to electron beam
Natsuda, Kenichiro, Allen, Robert D., Kozawa, Takahiro, Okamoto, Kazumasa, Saeki, Akinori, Tagawa, SeiichiVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846699
File:
PDF, 226 KB
english, 2010