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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Design specific joint optimization of masks and sources on a very large scale
Lai, K., Gabrani, M., Demaris, D., Casati, N., Torres, A., Sarkar, S., Strenski, P., Bagheri, S., Scarpazza, D., Rosenbluth, A. E., Melville, D. O., Wächter, A., Lee, J., Austel, V., Szeto-Millstone,Volume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.879787
File:
PDF, 1.91 MB
english, 2011