SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Design for Manufacturability through Design-Process Integration V - Is manufacturability with double patterning a burden on designer? Analyses of device and circuit aspects
Topaloglu, Rasit Onur, Rieger, Michael L.Volume:
7974
Year:
2011
Language:
english
DOI:
10.1117/12.882565
File:
PDF, 1.41 MB
english, 2011