SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Hot spot detection for indecomposable self-aligned double patterning layout
Zhang, Hongbo, Maurer, Wilhelm, Abboud, Frank E., Du, Yuelin, Wong, Martin D. F., Topaloglu, Rasit O.Volume:
8166
Year:
2011
Language:
english
DOI:
10.1117/12.896990
File:
PDF, 937 KB
english, 2011