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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Line-end gap measurement with YieldStar scatterometer: towards an OPC model calibration
Charley, A.-L., Dusa, M., Chiou, T.-B., Leray, P., Cheng, S., Fumar-Pici, A., Starikov, AlexanderVolume:
8324
Year:
2012
Language:
english
DOI:
10.1117/12.918028
File:
PDF, 1.24 MB
english, 2012