SPIE Proceedings [SPIE 1981 Microlithography Conferences - San Jose (Monday 30 March 1981)] Optical Characterization Techniques for Semiconductor Technology - Small Area Measurement Of Multiple Film Thicknesses, Dopant Concentrations And Impurity Levels Using A New Infrared Microspectrophotometer
Zearing, David J., Coates, Vincent J., Aspnes, David E., Potter, Roy F., So, Samuel S.Volume:
276
Year:
1981
Language:
english
DOI:
10.1117/12.931714
File:
PDF, 2.37 MB
english, 1981