Innovative Line Segment Fabrication Model of Near Field...

Journal of Computational and Theoretical Nanoscience 2011 / 09 Vol. 8; Iss. 9

Innovative Line Segment Fabrication Model of Near Field Photolithography and Simulation Analysis

Yang, Ching-Been
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Volume:
8
Language:
english
Journal:
Journal of Computational and Theoretical Nanoscience
DOI:
10.1166/jctn.2011.1891
Date:
September, 2011
File:
PDF, 1.40 MB
english, 2011
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