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Impact of strain on scaling of Double Gate nanoMOSFETs using NEGF approach
A. Martinez, K. Kalna, A. Svizhenko, M. P. Anantram, J. R. Barker, A. AsenovVolume:
5
Year:
2008
Language:
english
Pages:
5
DOI:
10.1002/pssc.200776574
File:
PDF, 358 KB
english, 2008