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Advantage of plasma-less deposition: Cat-CVD fabrication of a-Si TFT with current drivability equivalent to poly-Si TFT
Hideki Matsumura, Keisuke Ohdaira, Shogo NishizakiVolume:
7
Year:
2010
Language:
english
Pages:
1
DOI:
10.1002/pssc.200982821
File:
PDF, 197 KB
english, 2010