The formation of near surface SiGe layers with combined high-dose ion implantation and flash-lamp annealing
Matthias Voelskow, Ioannis Stoimenos, Lars Rebohle, Wolfgang SkorupaVolume:
8
Year:
2011
Language:
english
Pages:
4
DOI:
10.1002/pssc.201000159
File:
PDF, 280 KB
english, 2011