Graphene segregation on Ni/SiO2/Si substrates by alcohol...

physica status solidi (c) 2011 Vol. 8; Iss. 2

Graphene segregation on Ni/SiO2/Si substrates by alcohol CVD method

Yuta Miyasaka, Akihiro Matsuyama, Atsushi Nakamura, Jiro Temmyo
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Volume:
8
Year:
2011
Language:
english
Pages:
3
DOI:
10.1002/pssc.201000533
File:
PDF, 306 KB
english, 2011
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